Ultrathin film growth of silicides studied using microprobe reflection high-energy electron diffraction and Auger

Engineering & Materials Science

• Reflection high energy electron diffraction 100%
• Ultrathin films 78%
• Film growth 76%
• Silicides 66%
• Epitaxial films 36%
• Diffraction patterns 34%
• Epitaxial growth 34%
• Silicon 19%
• Temperature 9%

Chemical Compounds

• Reflection High Energy Electron Diffraction 78%
• Ultrathin Film 59%
• Kikuchi Reaction 42%
• Epitaxial Film 34%
• Epitaxial Growth 29%
• Strength 15%
• Chemical Transformation 15%
• Ambient Reaction Temperature 13%
• Surface 7%

Physics & Astronomy

• silicides 50%
• high energy electrons 48%
• line shape 46%
• electron diffraction 41%
• solid phases 22%
• surface layers 21%
• diffraction patterns 20%
• room temperature 13%
• curves 13%
• silicon 13%