The use of electron beam exposure and chemically enhanced vapor etching of SiO₂ for nanoscale fabrication

Engineering & Materials Science

• Electron beams 100%
• Etching 90%
• Vapors 75%
• Fabrication 62%
• Nanolithography 47%
• Self assembled monolayers 43%
• Organic acids 41%
• Monolayers 36%
• Nanotechnology 32%
• Silica 28%
• Masks 26%
• Scanning electron microscopy 22%
• Silicon 22%

Physics & Astronomy

• etching 63%
• vapors 63%
• electron beams 60%
• fabrication 51%
• nanofabrication 33%
• acids 25%
• masks 23%
• conductors 23%
• silicon dioxide 21%
• scanning electron microscopy 18%
• silicon 15%

Chemical Compounds

• Electron Beam 91%
• Etching 76%
• Nanolithography 38%
• Silicon Dioxide 34%
• Conductor 28%
• Organic Acid 28%
• Self Assembled Monolayer 27%
• Monolayer 21%