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The Thermodynamic Behavior of the Si-H System and Its Role in Si-CVD from SiH
4
Meng Tao
, Lee P. Hunt
Research output
:
Contribution to journal
›
Article
›
peer-review
8
Scopus citations
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Dive into the research topics of 'The Thermodynamic Behavior of the Si-H System and Its Role in Si-CVD from SiH
4
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Chemical Compounds
Partial Pressure
81%
Silane
81%
Chemical Vapour Deposition
77%
Nucleation
70%
Thermodynamics
53%
Pressure
49%
Liquid Film
41%
Engineering & Materials Science
Chemical vapor deposition
100%
Thermodynamics
73%
Silanes
36%
Temperature
34%
Partial pressure
33%
Nucleation
30%
Physics & Astronomy
vapor deposition
65%
thermodynamics
58%
silanes
23%
partial pressure
20%
low pressure
17%
nucleation
16%
temperature
6%