Semiconductor substrate cleaning and surface morphology in molecular beam epitaxy

Engineering & Materials Science

• Molecular beam epitaxy 100%
• Surface morphology 72%
• Cleaning 60%
• Semiconductor materials 57%
• Substrates 45%
• Etching 27%
• Contamination 25%
• Photoemission 23%
• Oxides 22%
• Photoelectron spectroscopy 22%
• Hydrogen 20%
• Carbon 19%
• Secondary ion mass spectrometry 19%
• Silicon oxides 18%
• Synchrotron radiation 18%
• Light scattering 18%
• Desorption 14%
• Lasers 9%
• Hot Temperature 6%

Chemical Compounds

• Molecular Beam Epitaxy 92%
• Semiconductor 49%
• Etching 38%
• Silicon Oxide 26%
• Photoemission 26%
• Secondary Ion Mass Spectroscopy 23%
• Oxide 23%
• Synchrotron Radiation 22%
• Photoelectron Spectroscopy 21%
• Surface 20%
• Carbon Atom 20%
• Light Scattering 19%
• Indicator 18%
• Desorption 16%

Physics & Astronomy

• cleaning 63%
• molecular beam epitaxy 54%
• contamination 23%
• photoelectric emission 22%
• etching 19%
• cleanliness 17%
• carbon 17%
• oxides 16%
• hydrogen 15%
• silicon oxides 13%
• secondary ion mass spectrometry 13%
• synchrotron radiation 11%
• desorption 11%
• light scattering 11%
• causes 7%
• spectroscopy 6%
• lasers 5%