Enhanced tunneling in stacked gate dielectrics with ultra-thin HfO 2 (ZrO2) layers sandwiched between thicker SiO2 layers

C. L. Hinkle, C. Fulton, R. J. Nemanich, G. Lucovsky

Research output: Contribution to journalConference articlepeer-review

7 Scopus citations

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Engineering & Materials Science

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