Electron-beam exposure of self-assembled monolayers of 10-undecenoic acid

Engineering & Materials Science

• Self assembled monolayers 93%
• Capacitance measurement 87%
• Chemical stability 81%
• Mechanical stability 79%
• Monolayers 79%
• Atomic force microscopy 76%
• Voltage measurement 75%
• Electron beams 71%
• Monomers 71%
• Electrons 60%
• Acids 54%

Chemical Compounds

• 10-Undecenoic Acid 100%
• Electron Beam 65%
• Self Assembled Monolayer 58%
• Dielectric Material 53%
• Atomic Force Microscopy 47%
• Monolayer 45%
• Voltage 43%
• Monomer 35%
• Electron Particle 32%
• Solvent 28%

Physics & Astronomy

• acids 54%
• electron beams 43%
• pinholes 22%
• electrical measurement 19%
• monomers 18%
• capacitance 16%
• atomic force microscopy 15%
• electrons 8%