Electron-beam exposure of self-assembled monolayers of 10-undecenoic acid

Michael Kozicki, S. J. Yang, B. W. Axelrod

Research output: Contribution to journalArticlepeer-review

Abstract

Tapping mode atomic force microscopy and capacitance versus voltage measurements were employed to study the effects of electron-beam exposure on self-assembled monolayers of 10-undecenoic acid. It was established that exposure increases chemical/mechanical stability, resulting in a thicker layer following a solvent treatment designed to remove residual monomers. Electron exposure also reduces the effects of pinholes in the monolayer, thereby improving dielectric quality.

Original languageEnglish (US)
Pages (from-to)481-484
Number of pages4
JournalSuperlattices and Microstructures
Volume27
Issue number5
DOIs
StatePublished - Jan 1 2000

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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