Effectiveness of reactive sputter-deposited Ta-N films as diffusion barriers for Ag metallization

Daniel Adams, Gerald F. Malgas, N. David Theodore, Rich Gregory, H. C. Kim, E. Misra, Terry Alford, J. W. Mayer

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Fingerprint

Dive into the research topics of 'Effectiveness of reactive sputter-deposited Ta-N films as diffusion barriers for Ag metallization'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy