Tin-based group IV semiconductors: New platforms for opto- and microelectronics on silicon

Research output: Chapter in Book/Report/Conference proceedingChapter

207 Scopus citations

Abstract

New classes of Sn-containing group IV semiconductors are described. Novel CVD routes lead to growth of a broad range of Ge 1-ySn y alloys and compounds directly on Si substrates. The direct bandgap (E 0) and optical transitions E 0 + A 0, E 1, E 1 + Δ 1, E 0′, and E 2 of Ge 1-ySn y, exhibit strong nonlinearities in the compositional dependence, and their bowing parameters correlate with those in Ge 1-xSi x, suggesting a scaling behavior for the electronic properties. The Ge 1-ySn y films can be used as "virtual substrates" for the subsequent growth of Ge 1-x-ySi xSn y ternaries. These are created for the first time and exhibit unprecedented thermal stability, superior crystallinity and unique optical and strain properties such as adjustable bandgaps, and controllable strain states (compressive, relaxed, and tensile). The synthesis of Ge 1-x-ySi xSn y makes it possible to decouple strain and bandgap and adds new levels of flexibility to the design of group IV devices. The Ge-Si-Sn system also represents a new class of "designer" templates for the monolithic integration of III-V and II-VI semiconductors with Si electronics.

Original languageEnglish (US)
Title of host publicationAnnual Review of Materials Research
Pages497-554
Number of pages58
DOIs
StatePublished - Oct 5 2006

Publication series

NameAnnual Review of Materials Research
Volume36
ISSN (Print)1531-7331

Keywords

  • Germanium
  • Integration
  • Optoelectronic
  • Silicon photonics
  • Sn

ASJC Scopus subject areas

  • Materials Science(all)

Fingerprint Dive into the research topics of 'Tin-based group IV semiconductors: New platforms for opto- and microelectronics on silicon'. Together they form a unique fingerprint.

  • Cite this