Synchrotron x-ray studies of vitreous SiO 2 over Si(001). I. Anisotropic glass contribution

M. Castro-Colin, W. Donner, S. C. Moss, Z. Islam, S. K. Sinha, R. Nemanich, H. T. Metzger, P. Bösecke, T. Shülli

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Abstract

While numerous investigations of the structure and interface of amorphous SiO 2 thermally grown on Si, theoretical as well as experimental, have been carried out over the years, a definitive picture of this thin gate oxide and its interface remains lacking. We have explored this issue using synchrotron x rays in grazing incidence geometry. In this geometry a fourfold modulation in the first sharp diffraction peak (FSDP) from thin vitreous SiO 2 of 100 and 500 Å thickness can be observed. While the FSDP exhibits a modulation throughout the entire film, this modulation decays away from the interface. Reflectivity measurements were also performed, which reveal an interfacial layer of 3% density increase in the SiO 2 film over the bulk (film) density.

Original languageEnglish (US)
Article number045310
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume71
Issue number4
DOIs
StatePublished - Jan 1 2005

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Castro-Colin, M., Donner, W., Moss, S. C., Islam, Z., Sinha, S. K., Nemanich, R., Metzger, H. T., Bösecke, P., & Shülli, T. (2005). Synchrotron x-ray studies of vitreous SiO 2 over Si(001). I. Anisotropic glass contribution. Physical Review B - Condensed Matter and Materials Physics, 71(4), [045310]. https://doi.org/10.1103/PhysRevB.71.045310