Structural interpretation of the vibrational spectra of a-Si: H alloys

G. Lucovsky, Robert Nemanich, J. C. Knights

Research output: Contribution to journalArticle

700 Citations (Scopus)

Abstract

The ir and Raman spectra of a-Si: H alloys produced by plasma decomposition of SiH4 are studied for a wide range of deposition conditions. The vibrational spectra display modes which can be characterized as predominantly hydrogen motions. Analysis of these modes shows four types of local Si-H bonding environments which are identified as SiH, SiH2, SiH3, and coupled SiH2 or (SiH2)n units. On the basis of these identifications, it is found that samples produced on high-temperature (above 200°C) substrates have SiH, SiH2, and (SiH2)n groups with very little SiH3. In contrast, the ir and Raman spectra of samples produced on room-temperature or cooled substrates are dominated by vibrational modes of SiH3 and (SiH2)n. The relative concentrations of these hydrogen-containing groups are not simply proportional to the total hydrogen concentration in a given sample.

Original languageEnglish (US)
Pages (from-to)2064-2073
Number of pages10
JournalPhysical Review B
Volume19
Issue number4
DOIs
StatePublished - 1979
Externally publishedYes

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Vibrational spectra
vibrational spectra
Hydrogen
Raman scattering
hydrogen
Raman spectra
Substrates
vibration mode
Decomposition
Plasmas
decomposition
Temperature
room temperature

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Structural interpretation of the vibrational spectra of a-Si : H alloys. / Lucovsky, G.; Nemanich, Robert; Knights, J. C.

In: Physical Review B, Vol. 19, No. 4, 1979, p. 2064-2073.

Research output: Contribution to journalArticle

Lucovsky, G. ; Nemanich, Robert ; Knights, J. C. / Structural interpretation of the vibrational spectra of a-Si : H alloys. In: Physical Review B. 1979 ; Vol. 19, No. 4. pp. 2064-2073.
@article{a35db796363b4f74934a86a5f17c94b1,
title = "Structural interpretation of the vibrational spectra of a-Si: H alloys",
abstract = "The ir and Raman spectra of a-Si: H alloys produced by plasma decomposition of SiH4 are studied for a wide range of deposition conditions. The vibrational spectra display modes which can be characterized as predominantly hydrogen motions. Analysis of these modes shows four types of local Si-H bonding environments which are identified as SiH, SiH2, SiH3, and coupled SiH2 or (SiH2)n units. On the basis of these identifications, it is found that samples produced on high-temperature (above 200°C) substrates have SiH, SiH2, and (SiH2)n groups with very little SiH3. In contrast, the ir and Raman spectra of samples produced on room-temperature or cooled substrates are dominated by vibrational modes of SiH3 and (SiH2)n. The relative concentrations of these hydrogen-containing groups are not simply proportional to the total hydrogen concentration in a given sample.",
author = "G. Lucovsky and Robert Nemanich and Knights, {J. C.}",
year = "1979",
doi = "10.1103/PhysRevB.19.2064",
language = "English (US)",
volume = "19",
pages = "2064--2073",
journal = "Physical Review B-Condensed Matter",
issn = "0163-1829",
publisher = "American Institute of Physics Publising LLC",
number = "4",

}

TY - JOUR

T1 - Structural interpretation of the vibrational spectra of a-Si

T2 - H alloys

AU - Lucovsky, G.

AU - Nemanich, Robert

AU - Knights, J. C.

PY - 1979

Y1 - 1979

N2 - The ir and Raman spectra of a-Si: H alloys produced by plasma decomposition of SiH4 are studied for a wide range of deposition conditions. The vibrational spectra display modes which can be characterized as predominantly hydrogen motions. Analysis of these modes shows four types of local Si-H bonding environments which are identified as SiH, SiH2, SiH3, and coupled SiH2 or (SiH2)n units. On the basis of these identifications, it is found that samples produced on high-temperature (above 200°C) substrates have SiH, SiH2, and (SiH2)n groups with very little SiH3. In contrast, the ir and Raman spectra of samples produced on room-temperature or cooled substrates are dominated by vibrational modes of SiH3 and (SiH2)n. The relative concentrations of these hydrogen-containing groups are not simply proportional to the total hydrogen concentration in a given sample.

AB - The ir and Raman spectra of a-Si: H alloys produced by plasma decomposition of SiH4 are studied for a wide range of deposition conditions. The vibrational spectra display modes which can be characterized as predominantly hydrogen motions. Analysis of these modes shows four types of local Si-H bonding environments which are identified as SiH, SiH2, SiH3, and coupled SiH2 or (SiH2)n units. On the basis of these identifications, it is found that samples produced on high-temperature (above 200°C) substrates have SiH, SiH2, and (SiH2)n groups with very little SiH3. In contrast, the ir and Raman spectra of samples produced on room-temperature or cooled substrates are dominated by vibrational modes of SiH3 and (SiH2)n. The relative concentrations of these hydrogen-containing groups are not simply proportional to the total hydrogen concentration in a given sample.

UR - http://www.scopus.com/inward/record.url?scp=0001383858&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0001383858&partnerID=8YFLogxK

U2 - 10.1103/PhysRevB.19.2064

DO - 10.1103/PhysRevB.19.2064

M3 - Article

AN - SCOPUS:0001383858

VL - 19

SP - 2064

EP - 2073

JO - Physical Review B-Condensed Matter

JF - Physical Review B-Condensed Matter

SN - 0163-1829

IS - 4

ER -