Selective Deposition of Ru by Digital Chemical Vapor Desposition

Physics & Astronomy

• ruthenium 100%
• etching 61%
• vapors 61%
• vapor deposition 31%
• costs 30%
• noble metals 30%
• damage 28%
• thin films 27%
• metals 27%
• semiconductor devices 27%
• electrodes 25%
• capacitors 23%
• wafers 20%
• osmium 19%
• control equipment 17%
• iridium 16%
• very large scale integration 16%
• random access memory 15%
• chemical properties 14%
• microelectronics 13%
• cleaning 13%
• platinum 13%
• metalorganic chemical vapor deposition 12%
• deposits 12%
• manufacturing 11%
• leakage 11%
• capacitance 10%
• mechanical properties 9%
• liquids 7%
• electronics 7%
• temperature 4%