Reversible stress relaxation during precoalescence interruptions of Volmer-Weber thin film growth

Cody Friesen, C. V. Thompson

Research output: Contribution to journalArticle

113 Citations (Scopus)

Abstract

The relaxation of reversible stress during precoalescence interruptions of Volmer-Weber thin film growth was studied. The stress changes in both precoalescence and postcoalescence regimes of growth were due to changes in population during and after deposition. Results showed that less than a tenth of a monolayer deposition resulted in an instantaneous stress of order 1 GPa.

Original languageEnglish (US)
Pages (from-to)1261031-1261034
Number of pages4
JournalPhysical Review Letters
Volume89
Issue number12
StatePublished - Sep 16 2002
Externally publishedYes

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  • Physics and Astronomy(all)

Cite this

Reversible stress relaxation during precoalescence interruptions of Volmer-Weber thin film growth. / Friesen, Cody; Thompson, C. V.

In: Physical Review Letters, Vol. 89, No. 12, 16.09.2002, p. 1261031-1261034.

Research output: Contribution to journalArticle

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