Reflection electron microscopy of buried interfaces in the transmission geometry

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We consider a thin film in TEM containing a vertical interface in the plane of the beam. The intensity of the specular beam reflected from the interface is considered under multiple scattering conditions. For an atomically abrupt (100) interface between Au and MgO, this beam is found to have appreciable intensity, comparable to the (000) beam, at a certain thickness. The wavefield corresponding to this reflection is confined to a narrow sheet at the interface if the Bragg condition is avoided. The formation of a reflection dark-field image of such an internal interface is discussed, for the purpose of observing interface reactions at high temperature. The use of an imaging energy filter fitted to a high voltage microscope is proposed for this purpose. The use of this specular reflection for microanalysis by energy loss spectroscopy and the study of interatomic bonding at interfaces is also suggested.

Original languageEnglish (US)
Pages (from-to)293-301
Number of pages9
JournalUltramicroscopy
Volume55
Issue number3
DOIs
StatePublished - 1994

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Electron microscopy
electron microscopy
Geometry
geometry
Multiple scattering
Microanalysis
Energy dissipation
Microscopes
Spectroscopy
Transmission electron microscopy
Imaging techniques
Thin films
Electric potential
specular reflection
microanalysis
high voltages
energy dissipation
microscopes
Temperature
filters

ASJC Scopus subject areas

  • Materials Science(all)
  • Instrumentation

Cite this

Reflection electron microscopy of buried interfaces in the transmission geometry. / Spence, John.

In: Ultramicroscopy, Vol. 55, No. 3, 1994, p. 293-301.

Research output: Contribution to journalArticle

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