Performance characteristics of InAlGaN laser diodes depending on electron blocking layer and waveguiding layer design grown by metalorganic chemical vapordeposition

Jianping Liu, Yun Zhang, Zachary Lochner, Seong Soo Kim, Hyunsoo Kim, Jae Hyun Ryou, Shyh Chiang Shen, P. Doug Yoder, Russell D. Dupuis, Qiyuan Y. Wei, Kewei W. Sun, Alec M. Fischer, Fernando Ponce

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

We report the effects of epitaxial layer design on III-N visible laser diode (LD) performance. In order to mitigate electron accumulation at the interface between the top GaN quantum barrier and the AlGaN electron blocking layer (EBL) induced by polarization fields, a tapered AlGaN EBL was used. Compared to LDs with conventional AlGaN EBLs, the threshold current density of LDs with a tapered AlGaN EBL is significantly reduced and the slope efficiency is increased. In0.03Ga0.97N was used as waveguide layers in blue LD structures to increase the optical confinement. It is observed that In0.03Ga0.97N waveguiding layers significantly improve the emission efficiency of the active region in addition to offering better optical confinement. The responsible underlying mechanism has been investigated.

Original languageEnglish (US)
Pages (from-to)272-277
Number of pages6
JournalJournal of Crystal Growth
Volume315
Issue number1
DOIs
StatePublished - Jan 15 2011

Keywords

  • A3. Metalorganic chemical vapor deposition
  • B2. Semiconducting IIIV materials
  • B3. Laser diodes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Fingerprint

Dive into the research topics of 'Performance characteristics of InAlGaN laser diodes depending on electron blocking layer and waveguiding layer design grown by metalorganic chemical vapordeposition'. Together they form a unique fingerprint.

Cite this