Novel Parylene-N films deposited at liquid nitrogen temperatures

James Erjavec, John Sikita, Stephen P. Beaudoin, Gregory Raupp

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

Vapor deposition polymerization of Parylene-N films at -196 °C produces optically opaque, highly porous films. Film density averaged 0.195 g/cm3, more than five times less than that of conventional non-porous Parylene-N films deposited near room temperature, which have densities of 1.11 g/cm3. Deposition rates, measured as the change in film thickness per unit time, averaged 8.3 μm/min. This rate is more than two orders of magnitude greater than the deposition rates of nonporous films near room temperature, at otherwise fixed conditions of monomer delivery rate and deposition chamber pressure. On a mass deposition rate basis, the new low temperature film deposition rate is more than an order of magnitude faster than the corresponding rate at room temperature.

Original languageEnglish (US)
Pages (from-to)339-342
Number of pages4
JournalMaterials Letters
Volume39
Issue number6
DOIs
Publication statusPublished - Jun 1999

    Fingerprint

ASJC Scopus subject areas

  • Materials Science(all)

Cite this