Nano-metal-assisted chemical etching for fabricating semiconductor and optoelectronic devices

Owen Hildreth, C. P. Wong

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Scopus citations

Abstract

This chapter summarizes the current state-of-the-art for semiconductor and optoelectronic device fabrication using Metal-assisted chemical Etching (MacEtch). It details MacEtch’s history, the physics and chemistry, processing considerations, and applications in device fabrication.

Original languageEnglish (US)
Title of host publicationMaterials for Advanced Packaging, Second Edition
PublisherSpringer International Publishing
Pages879-922
Number of pages44
ISBN (Electronic)9783319450988
ISBN (Print)9783319450971
DOIs
StatePublished - Jan 1 2016

Keywords

  • Catalyst
  • Etching
  • MaCE
  • MacEtch
  • Metal-assisted chemical etching
  • Microelectronics packaging
  • Nanofabrication
  • Silicon
  • Thru silicon via (TSV)

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)

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  • Cite this

    Hildreth, O., & Wong, C. P. (2016). Nano-metal-assisted chemical etching for fabricating semiconductor and optoelectronic devices. In Materials for Advanced Packaging, Second Edition (pp. 879-922). Springer International Publishing. https://doi.org/10.1007/978-3-319-45098-8_21