Modeling Cu thin film growth

James Adams, Zhiyong Wang, Youhong Li

Research output: Contribution to journalArticle

49 Scopus citations

Abstract

A general overview of methods of modeling thin film growth on an atomic scale is provided, focusing on molecular dynamics (MD), energy minimization, and Monte Carlo methods. We emphasize how different methods can be integrated to provide a more powerful predictive capability. We give examples of how one can use atomic-level information to predict nucleation rates and facet growth rates of Cu island.

Original languageEnglish (US)
Pages (from-to)201-210
Number of pages10
JournalThin Solid Films
Volume365
Issue number2
DOIs
StatePublished - Apr 17 2000

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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