Modeling Cu thin film growth

James Adams, Zhiyong Wang, Youhong Li

Research output: Contribution to journalArticle

49 Citations (Scopus)

Abstract

A general overview of methods of modeling thin film growth on an atomic scale is provided, focusing on molecular dynamics (MD), energy minimization, and Monte Carlo methods. We emphasize how different methods can be integrated to provide a more powerful predictive capability. We give examples of how one can use atomic-level information to predict nucleation rates and facet growth rates of Cu island.

Original languageEnglish (US)
Pages (from-to)201-210
Number of pages10
JournalThin Solid Films
Volume365
Issue number2
DOIs
StatePublished - Apr 17 2000

Fingerprint

Film growth
Molecular dynamics
Monte Carlo methods
Nucleation
general overviews
Thin films
thin films
Monte Carlo method
flat surfaces
nucleation
molecular dynamics
optimization
energy

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Modeling Cu thin film growth. / Adams, James; Wang, Zhiyong; Li, Youhong.

In: Thin Solid Films, Vol. 365, No. 2, 17.04.2000, p. 201-210.

Research output: Contribution to journalArticle

Adams, James ; Wang, Zhiyong ; Li, Youhong. / Modeling Cu thin film growth. In: Thin Solid Films. 2000 ; Vol. 365, No. 2. pp. 201-210.
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