This work investigates the mechanical properties of indium tin oxide deposited on polyethylene napthalate substrates by rf sputtering method as a function of deposition conditions, including rf power, substrate temperature, and substrate treatment. X-ray diffraction analysis, Rutherford backscattering spectrometry and mechanical bending analysis are used for characterization of samples. The best mechanical performance represented by bending of the film stack is obtained from high substrate temperature and low rf power. Plasma treatment gases also influence mechanical properties, with mixture of nitrogen and hydrogen gases producing the best results. This work provides an initial understanding of the impact of sputter process conditions on film's mechanical performance.