Materials Considerations for Advances in Submicron Very Large Scale Integration

D. K. Ferry

Research output: Contribution to journalArticle

6 Citations (Scopus)
Original languageEnglish (US)
Pages (from-to)311-390
Number of pages80
JournalAdvances in Electronics and Electron Physics
Volume58
Issue numberC
DOIs
StatePublished - 1982
Externally publishedYes

Fingerprint

VLSI circuits
very large scale integration
Capacitance
Indium phosphide
capacitance
indium phosphides
Silicon
field effect transistors
MESFET devices
silicon
Gallium arsenide
MOSFET devices
quaternary alloys
JFET
Field effect transistors
Band structure
packing density
Thermal conductivity
metal oxide semiconductors
gallium

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Nuclear and High Energy Physics
  • Condensed Matter Physics

Cite this

Materials Considerations for Advances in Submicron Very Large Scale Integration. / Ferry, D. K.

In: Advances in Electronics and Electron Physics, Vol. 58, No. C, 1982, p. 311-390.

Research output: Contribution to journalArticle

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