ITO/SiOx:H stacks for silicon heterojunction solar cells

Stanislau Herasimenka, William J. Dauksher, Mathieu Boccard, Stuart Bowden

Research output: Contribution to journalArticlepeer-review

31 Scopus citations

Abstract

A method of reducing optical losses in the transparent conductive oxides (TCO) used in silicon heterojunction solar cells without compromising with series resistance is described. In the method the thickness of a TCO is reduced two-three times and a hydrogenated dielectric is deposited on top to form a double layer antireflection coating. The conductivity of a thin TCO is increased due to the effect of hydrogen treatment supplied from the capping dielectric during the post deposition annealing. The optimized cells with ITO/SiOx:H stacks achieved more than 41 mA/cm2 generation current on 120-micron-thick wafers while having approximately 100 Ω/square sheet resistance. The paper also considers integration of ITO/SiOx:H stacks with Cu plating and using ITO/SiNx/SiOx triple layer antireflection coatings.

Original languageEnglish (US)
Pages (from-to)98-101
Number of pages4
JournalSolar Energy Materials and Solar Cells
Volume158
DOIs
StatePublished - Dec 1 2016

Keywords

  • Silicon heterojunction solar cells
  • Transparent conductive oxides

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'ITO/SiO<sub>x</sub>:H stacks for silicon heterojunction solar cells'. Together they form a unique fingerprint.

Cite this