Abstract
An ion-implanted self-aligned-gate quantum-well metal-insulator-inverted-interface semiconductor FET (QW-MI**3SFET) has been demonstrated. Experimental and computer results show that this geometry is useful for achieving low ohmic contact resistance and access sheet resistance in quantum-well heterostructure FETs, despite the presence of heterointerfaces in the n plus access regions. In particular, ohmic contact resistance and sheet resistance values as low as 0. 29 OMEGA -mm and 290 OMEGA / D'ALEMB , respectively, have been achieved at room temperature, compared with values of 2. 0 OMEGA -mm and 1000 OMEGA / D'ALEMB , for recessed-gate designs. The barrier presented by the AlGaAs layer to deep-implanted regions is found to introduce an additional contact resistance of 0. 75 OMEGA -mm in the structures. A reduction of this resistance may be possible by optimizing the implant so as to produce enhanced compositional disordering within the n plus regions.
| Original language | English (US) |
|---|---|
| Title of host publication | Unknown Host Publication Title |
| Publisher | IEEE |
| Pages | 144-153 |
| Number of pages | 10 |
| State | Published - 1987 |
| Externally published | Yes |
ASJC Scopus subject areas
- General Engineering