Influence of underlayer and encapsulation process on texture in polycrystalline silver thin films

Yuxiao Zeng, Y. L. Zou, Terry Alford, F. Deng, S. S. Lau, T. Laursen, B. Manfred Ullrich

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The texture in polycrystalline Ag thin films prepared by e-beam evaporation has been characterized by an x-ray diffraction technique as a function of underlayers and encapsulation temperatures. The Ag films deposited on Ti layers showed a strong 〈111〉 fiber texture with a fiber axis parallel to the film normal, whereas an almost random orientation was observed in the Ag films on Cr layers. This underlayer dependence of texture is associated with the lattice match between Ag and underlayer metal. In addition to 〈111〉 texture, the Ag films on Ti also exhibited a 〈511〉 texture component, which is the result of twinning of 〈111〉-oriented grains. After the encapsulation process, the 〈111〉 texture in the Ag films on Ti was significantly improved, as evidenced by an increased (111) diffraction intensity and a slightly narrower space distribution of the texture along the fiber axis. The highly textured Ag films are expected to exhibit an improved electromigration resistance.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMRS
Pages203-208
Number of pages6
Volume472
StatePublished - 1997
Externally publishedYes
EventProceedings of the 1997 MRS Spring Symposium - San Francisco, CA, USA
Duration: Apr 1 1997Apr 4 1997

Other

OtherProceedings of the 1997 MRS Spring Symposium
CitySan Francisco, CA, USA
Period4/1/974/4/97

Fingerprint

Encapsulation
Silver
Textures
Thin films
Fibers
Diffraction
Electromigration
Twinning
Evaporation
Metals
X rays

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Zeng, Y., Zou, Y. L., Alford, T., Deng, F., Lau, S. S., Laursen, T., & Ullrich, B. M. (1997). Influence of underlayer and encapsulation process on texture in polycrystalline silver thin films. In Materials Research Society Symposium - Proceedings (Vol. 472, pp. 203-208). MRS.

Influence of underlayer and encapsulation process on texture in polycrystalline silver thin films. / Zeng, Yuxiao; Zou, Y. L.; Alford, Terry; Deng, F.; Lau, S. S.; Laursen, T.; Ullrich, B. Manfred.

Materials Research Society Symposium - Proceedings. Vol. 472 MRS, 1997. p. 203-208.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zeng, Y, Zou, YL, Alford, T, Deng, F, Lau, SS, Laursen, T & Ullrich, BM 1997, Influence of underlayer and encapsulation process on texture in polycrystalline silver thin films. in Materials Research Society Symposium - Proceedings. vol. 472, MRS, pp. 203-208, Proceedings of the 1997 MRS Spring Symposium, San Francisco, CA, USA, 4/1/97.
Zeng Y, Zou YL, Alford T, Deng F, Lau SS, Laursen T et al. Influence of underlayer and encapsulation process on texture in polycrystalline silver thin films. In Materials Research Society Symposium - Proceedings. Vol. 472. MRS. 1997. p. 203-208
Zeng, Yuxiao ; Zou, Y. L. ; Alford, Terry ; Deng, F. ; Lau, S. S. ; Laursen, T. ; Ullrich, B. Manfred. / Influence of underlayer and encapsulation process on texture in polycrystalline silver thin films. Materials Research Society Symposium - Proceedings. Vol. 472 MRS, 1997. pp. 203-208
@inproceedings{e74626c455984c9a99a02e9253d7cde2,
title = "Influence of underlayer and encapsulation process on texture in polycrystalline silver thin films",
abstract = "The texture in polycrystalline Ag thin films prepared by e-beam evaporation has been characterized by an x-ray diffraction technique as a function of underlayers and encapsulation temperatures. The Ag films deposited on Ti layers showed a strong 〈111〉 fiber texture with a fiber axis parallel to the film normal, whereas an almost random orientation was observed in the Ag films on Cr layers. This underlayer dependence of texture is associated with the lattice match between Ag and underlayer metal. In addition to 〈111〉 texture, the Ag films on Ti also exhibited a 〈511〉 texture component, which is the result of twinning of 〈111〉-oriented grains. After the encapsulation process, the 〈111〉 texture in the Ag films on Ti was significantly improved, as evidenced by an increased (111) diffraction intensity and a slightly narrower space distribution of the texture along the fiber axis. The highly textured Ag films are expected to exhibit an improved electromigration resistance.",
author = "Yuxiao Zeng and Zou, {Y. L.} and Terry Alford and F. Deng and Lau, {S. S.} and T. Laursen and Ullrich, {B. Manfred}",
year = "1997",
language = "English (US)",
volume = "472",
pages = "203--208",
booktitle = "Materials Research Society Symposium - Proceedings",
publisher = "MRS",

}

TY - GEN

T1 - Influence of underlayer and encapsulation process on texture in polycrystalline silver thin films

AU - Zeng, Yuxiao

AU - Zou, Y. L.

AU - Alford, Terry

AU - Deng, F.

AU - Lau, S. S.

AU - Laursen, T.

AU - Ullrich, B. Manfred

PY - 1997

Y1 - 1997

N2 - The texture in polycrystalline Ag thin films prepared by e-beam evaporation has been characterized by an x-ray diffraction technique as a function of underlayers and encapsulation temperatures. The Ag films deposited on Ti layers showed a strong 〈111〉 fiber texture with a fiber axis parallel to the film normal, whereas an almost random orientation was observed in the Ag films on Cr layers. This underlayer dependence of texture is associated with the lattice match between Ag and underlayer metal. In addition to 〈111〉 texture, the Ag films on Ti also exhibited a 〈511〉 texture component, which is the result of twinning of 〈111〉-oriented grains. After the encapsulation process, the 〈111〉 texture in the Ag films on Ti was significantly improved, as evidenced by an increased (111) diffraction intensity and a slightly narrower space distribution of the texture along the fiber axis. The highly textured Ag films are expected to exhibit an improved electromigration resistance.

AB - The texture in polycrystalline Ag thin films prepared by e-beam evaporation has been characterized by an x-ray diffraction technique as a function of underlayers and encapsulation temperatures. The Ag films deposited on Ti layers showed a strong 〈111〉 fiber texture with a fiber axis parallel to the film normal, whereas an almost random orientation was observed in the Ag films on Cr layers. This underlayer dependence of texture is associated with the lattice match between Ag and underlayer metal. In addition to 〈111〉 texture, the Ag films on Ti also exhibited a 〈511〉 texture component, which is the result of twinning of 〈111〉-oriented grains. After the encapsulation process, the 〈111〉 texture in the Ag films on Ti was significantly improved, as evidenced by an increased (111) diffraction intensity and a slightly narrower space distribution of the texture along the fiber axis. The highly textured Ag films are expected to exhibit an improved electromigration resistance.

UR - http://www.scopus.com/inward/record.url?scp=0031359276&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031359276&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0031359276

VL - 472

SP - 203

EP - 208

BT - Materials Research Society Symposium - Proceedings

PB - MRS

ER -