Abstract
We describe the synthesis and use of the novel molecular precursors C(SiH 3) 4, CH 3GeH 3, and SiH 3CH 2GeH 3 to generate silicon-carbon-germanium materials by ultrahigh vacuum chemical vapor deposition. By using these precursors in reactions with SiH 4 and GeH 4 between 470°C and 650°C we obtained: 1) heteroepitaxial Si 1-x-yGe xC y (y=0.04-0.06) alloys with C(SiH 3) 4; (2) polycrystalline alloys with carbon compositions ranging from 2-14 at.% with CH 3GeH 3; (3) mixtures of diamond cubic nanocrystals (Ge, Si 1-xGe x) and amorphous SiC with SiH 3CH 2GeH 3. The effect of the precursor chemistry on composition, crystallinity, and microstructure of the materials as characterized by Rutherford backscattering spectroscopy (RBS), secondary ion mass spectrometry (SIMS) and transmission electron microscopy (TEM) is discussed.
Original language | English (US) |
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Title of host publication | Materials Research Society Symposium - Proceedings |
Editors | Michael Hack, Eric A. Schiff, Arun Madan, Martin Powell, Akihisa Matsuda |
Publisher | Materials Research Society |
Pages | 529-534 |
Number of pages | 6 |
Volume | 377 |
State | Published - 1995 |
Event | Proceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA Duration: Apr 18 1995 → Apr 21 1995 |
Other
Other | Proceedings of the 1995 MRS Spring Meeting |
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City | San Francisco, CA, USA |
Period | 4/18/95 → 4/21/95 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials