@article{d50b854c99814f9280dd9a9cab6d59e4,
title = "Influence of charge placement on the thermal and morphological properties of sulfonated segmented copolyesters",
abstract = "A new synthetic strategy using melt transesterification enabled selective control of ionic charge placement into the hard segment or soft segment block of segmented copolyesters. Dynamic mechanical analysis of sulfonated soft segment copolyesters revealed an increase in the low-Tg transition and rubbery plateau storage modulus as a function of sulfonation level. Sulfonated hard segment copolyesters displayed similar rubbery plateau moduli and decreasing flow temperature from 145 to 90 C. Dynamic melt rheology and in situ, variable temperature small-angle X-ray scattering determined the non-sulfonated copolyester order-disorder transition at 150 ± 5 C, which was ∼60 C above the hard segment Tg. Atomic force microscopy revealed sulfonated hard segment copolyesters contained more disordered surface morphologies. Sulfonated soft segment copolyesters demonstrated increased tensile stress and improved tensile strain from 18 to 170% with increasing ion content. The enhanced mechanical performance of sulfonated soft segment was attributed to the preserved microphase-separated morphology and the presence of physical crosslinks from electrostatic interactions.",
keywords = "Melt polycondensation, Polyesters, Segmented block copolymers",
author = "Musan Zhang and Mingqiang Zhang and Moore, {Robert B.} and Long, {Timothy E.}",
note = "Funding Information: This work is supported in part by the U.S. Army Research Laboratory and the U.S. Army Research Office under the Army Materials Center of Excellence Program , contract W911NF-06-2-0014 . We acknowledge the Advanced Photon Source supported by the U. S. Department of Energy, Office of Science, Office of Basic Energy Sciences , under Contract No. W-31-109-Eng-38 , for access to the beamtime 5ID-D, operated by DND-CAT. The DND-CAT is supported by the E.I. DuPont de Nemours & Co. , The Dow Chemical Company , the U.S. National Science Foundation through Grant DMR-9304725 and the State of Illinois through the Department of Commerce and the Board of Higher Education Grant IBHE HECA NWU 96 . The diode beam stops were constructed at DuPont by Robert F. Knox and Mark G. Bradigan under J. David Londono's direction. The authors would also like to thank Eastman Chemical Company for providing CBDO and DMCD monomers and the Riffle research group for chloroform GPC analysis. We extend our gratitude to Ninad Dixit for his collaboration on this project and Professor Garth Wilkes for his expertise and discussions. In addition, the authors thank Steve McCartney at the Virginia Tech Institute of Critical Technology and Applied Sciences (ICTAS) Nanoscale Characterization and Fabrication Laboratory (NCFL) for atomic force microscopy assistance and training. ",
year = "2013",
month = jun,
day = "21",
doi = "10.1016/j.polymer.2013.05.004",
language = "English (US)",
volume = "54",
pages = "3521--3528",
journal = "Polymer",
issn = "0032-3861",
publisher = "Elsevier BV",
number = "14",
}