We describe Bragg diffraction of relativistic electron beams through a patterned Si crystal consisting of alternating thick and thin strips to produce nanometer scale electron density modulations. Multi-slice simulations show that a two-beam situation can be set up where, for a particular thickness of Si, nearly 100% of the electron beam is diffracted. Plans are underway to carry out experiments showing this effect in UCLA's ultrafast electron microscopy lab with 3.5 MeV electrons. We will select either the diffracted beam or the primary beam with a small aperture in the diffraction plane of a magnetic lens, and so record either the dark or bright field magnified image of the strips. Our first goal is to observe the nanopatterned beam at the image plane. We will then investigate various crystal thicknesses and sample orientations to maximize the contrast in the pattern and explore tuning the period of the modulation through varying magnification.