Abstract
GaN films have been grown by molecular beam epitaxy (MBE) using a hollow‐anode nitrogen plasma source. The source was developed to minimize defect formation as a result of contamination and ion damage. The hollow‐anode discharge is a special form of glow discharge with very small anode area. A positive anode voltage drop of 30–40 V and an increased anode sheath thickness leads to ignition of a relatively dense plasma in front of the anode hole. Driven by the pressure gradient, the ‘‘anode’’ plasma forms a bright plasma jet streaming with supersonic velocity towards the substrate. Films of GaN have been grown on (0001) SiC and (0001) Al2O3 at 600–800 °C. The films were investigated by photoluminescence, cathodoluminescence, x‐ray diffraction, Rutherford backscattering, and particle‐induced x‐ray emission. The film with the highest structural quality had a rocking curve width of 5 arcmin, the lowest reported value for MBE growth to date.
Original language | English (US) |
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Pages (from-to) | 905-907 |
Number of pages | 3 |
Journal | Review of Scientific Instruments |
Volume | 67 |
Issue number | 3 |
DOIs | |
State | Published - Mar 1996 |
Externally published | Yes |
Keywords
- ALUMINIUM OXIDES
- CATHODOLUMINESCENCE
- CRYSTAL STRUCTURE
- FILMS
- GALLIUM NITRIDES
- GLOW DISCHARGES
- MOLECULAR BEAM EPITAXY
- NITROGEN
- PHOTOLUMINESCENCE
- PLASMA SHEATH
- SILICON CARBIDES
- SUBSTRATES
- TEMPERATURE RANGE 0400−1000 K
- TEMPERATURE RANGE 1000−4000 K
ASJC Scopus subject areas
- Instrumentation