Abstract
High-resolution electron microscopy has been utilized to elucidate the structural nature of oxygen-containing planar inversion domain boundaries in aluminum nitride. A model for this defect is proposed which incorporates the necessary structural elements needed to describe the entire AlN-Al2O3 system. Image simulations of the proposed defect structure, for a range of imaging conditions, are in excellent agreement with experimental micrographs and provide substantial evidence for the validity of the proposed model.
Original language | English (US) |
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Pages (from-to) | 291-299 |
Number of pages | 9 |
Journal | Ultramicroscopy |
Volume | 40 |
Issue number | 3 |
DOIs | |
State | Published - Mar 1992 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Instrumentation