Formation of nanoporous noble metal thin films by electrochemical dealloying of Pt xSi 1-x

J. C. Thorp, Karl Sieradzki, Lei Tang, Peter Crozier, Amit Misra, Michael Nastasi, David Mitlin, S. T. Picraux

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We demonstrate the synthesis of nanoporous Pt thin films on Si by electrochemical dealloying. Amorphous Ptx Si1-x films (∼100-250 nm thick) are formed by electron beam codeposition and dealloyed in aqueous HF solutions at an electrochemical potential sufficient to selectively remove Si while allowing self-assembly of Pt into a nanoporous structure. The Pt nanoporous layers have a pore size of 5-20 nm, ligament thickness ∼5 nm, a surface area enhancements >20 times, and an ultrafine grain polycrystalline microstructure.

Original languageEnglish (US)
Article number033110
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Issue number3
StatePublished - Jan 30 2006


ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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