Formation of nanoporous noble metal thin films by electrochemical dealloying of Pt xSi 1-x

J. C. Thorp, Karl Sieradzki, Lei Tang, Peter Crozier, Amit Misra, Michael Nastasi, David Mitlin, S. T. Picraux

Research output: Contribution to journalArticle

125 Citations (Scopus)

Abstract

We demonstrate the synthesis of nanoporous Pt thin films on Si by electrochemical dealloying. Amorphous Ptx Si1-x films (∼100-250 nm thick) are formed by electron beam codeposition and dealloyed in aqueous HF solutions at an electrochemical potential sufficient to selectively remove Si while allowing self-assembly of Pt into a nanoporous structure. The Pt nanoporous layers have a pore size of 5-20 nm, ligament thickness ∼5 nm, a surface area enhancements >20 times, and an ultrafine grain polycrystalline microstructure.

Original languageEnglish (US)
Article number033110
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume88
Issue number3
DOIs
StatePublished - 2006

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ligaments
noble metals
self assembly
electron beams
porosity
microstructure
augmentation
synthesis
thin films

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Formation of nanoporous noble metal thin films by electrochemical dealloying of Pt xSi 1-x . / Thorp, J. C.; Sieradzki, Karl; Tang, Lei; Crozier, Peter; Misra, Amit; Nastasi, Michael; Mitlin, David; Picraux, S. T.

In: Applied Physics Letters, Vol. 88, No. 3, 033110, 2006, p. 1-3.

Research output: Contribution to journalArticle

Thorp, J. C. ; Sieradzki, Karl ; Tang, Lei ; Crozier, Peter ; Misra, Amit ; Nastasi, Michael ; Mitlin, David ; Picraux, S. T. / Formation of nanoporous noble metal thin films by electrochemical dealloying of Pt xSi 1-x In: Applied Physics Letters. 2006 ; Vol. 88, No. 3. pp. 1-3.
@article{6ce58eef14ce4824841bd3fc5e688264,
title = "Formation of nanoporous noble metal thin films by electrochemical dealloying of Pt xSi 1-x",
abstract = "We demonstrate the synthesis of nanoporous Pt thin films on Si by electrochemical dealloying. Amorphous Ptx Si1-x films (∼100-250 nm thick) are formed by electron beam codeposition and dealloyed in aqueous HF solutions at an electrochemical potential sufficient to selectively remove Si while allowing self-assembly of Pt into a nanoporous structure. The Pt nanoporous layers have a pore size of 5-20 nm, ligament thickness ∼5 nm, a surface area enhancements >20 times, and an ultrafine grain polycrystalline microstructure.",
author = "Thorp, {J. C.} and Karl Sieradzki and Lei Tang and Peter Crozier and Amit Misra and Michael Nastasi and David Mitlin and Picraux, {S. T.}",
year = "2006",
doi = "10.1063/1.2161939",
language = "English (US)",
volume = "88",
pages = "1--3",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "3",

}

TY - JOUR

T1 - Formation of nanoporous noble metal thin films by electrochemical dealloying of Pt xSi 1-x

AU - Thorp, J. C.

AU - Sieradzki, Karl

AU - Tang, Lei

AU - Crozier, Peter

AU - Misra, Amit

AU - Nastasi, Michael

AU - Mitlin, David

AU - Picraux, S. T.

PY - 2006

Y1 - 2006

N2 - We demonstrate the synthesis of nanoporous Pt thin films on Si by electrochemical dealloying. Amorphous Ptx Si1-x films (∼100-250 nm thick) are formed by electron beam codeposition and dealloyed in aqueous HF solutions at an electrochemical potential sufficient to selectively remove Si while allowing self-assembly of Pt into a nanoporous structure. The Pt nanoporous layers have a pore size of 5-20 nm, ligament thickness ∼5 nm, a surface area enhancements >20 times, and an ultrafine grain polycrystalline microstructure.

AB - We demonstrate the synthesis of nanoporous Pt thin films on Si by electrochemical dealloying. Amorphous Ptx Si1-x films (∼100-250 nm thick) are formed by electron beam codeposition and dealloyed in aqueous HF solutions at an electrochemical potential sufficient to selectively remove Si while allowing self-assembly of Pt into a nanoporous structure. The Pt nanoporous layers have a pore size of 5-20 nm, ligament thickness ∼5 nm, a surface area enhancements >20 times, and an ultrafine grain polycrystalline microstructure.

UR - http://www.scopus.com/inward/record.url?scp=31144478161&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=31144478161&partnerID=8YFLogxK

U2 - 10.1063/1.2161939

DO - 10.1063/1.2161939

M3 - Article

AN - SCOPUS:31144478161

VL - 88

SP - 1

EP - 3

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 3

M1 - 033110

ER -