Fabrication of Cr nanostructures with the scanning tunnelling microscope

W. Xie, X. Dai, L. S. Xu, David Allee, J. Spector

Research output: Contribution to journalArticle

7 Scopus citations

Abstract

In this work, nanometer scale electrically conducting lines and quantum structures on chromium (Cr) films have been fabricated with an ambient scanning tunnelling microscope and a subsequent CR-14 chromium etch. The line width of these structures is approximately 60 nm and the height of the lines is approximately 10 nm. In addition, experiments have been performed to determine the Cr etch rate in CR-14 etchant and the thickness of the Cr layer that could be oxidized through by the STM tunnelling current.

Original languageEnglish (US)
Pages (from-to)88-93
Number of pages6
JournalNanotechnology
Volume8
Issue number2
DOIs
StatePublished - Jun 1 1997

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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