Fabrication of Cr nanostructures with the scanning tunnelling microscope

W. Xie, X. Dai, L. S. Xu, David Allee, J. Spector

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

In this work, nanometer scale electrically conducting lines and quantum structures on chromium (Cr) films have been fabricated with an ambient scanning tunnelling microscope and a subsequent CR-14 chromium etch. The line width of these structures is approximately 60 nm and the height of the lines is approximately 10 nm. In addition, experiments have been performed to determine the Cr etch rate in CR-14 etchant and the thickness of the Cr layer that could be oxidized through by the STM tunnelling current.

Original languageEnglish (US)
Pages (from-to)88-93
Number of pages6
JournalNanotechnology
Volume8
Issue number2
DOIs
StatePublished - Jun 1997

Fingerprint

Chromium
chromium
Nanostructures
Microscopes
microscopes
Scanning
Fabrication
fabrication
scanning
etchants
Linewidth
conduction
Experiments

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Fabrication of Cr nanostructures with the scanning tunnelling microscope. / Xie, W.; Dai, X.; Xu, L. S.; Allee, David; Spector, J.

In: Nanotechnology, Vol. 8, No. 2, 06.1997, p. 88-93.

Research output: Contribution to journalArticle

Xie, W. ; Dai, X. ; Xu, L. S. ; Allee, David ; Spector, J. / Fabrication of Cr nanostructures with the scanning tunnelling microscope. In: Nanotechnology. 1997 ; Vol. 8, No. 2. pp. 88-93.
@article{0d746a3856d14733bbef693b8b415187,
title = "Fabrication of Cr nanostructures with the scanning tunnelling microscope",
abstract = "In this work, nanometer scale electrically conducting lines and quantum structures on chromium (Cr) films have been fabricated with an ambient scanning tunnelling microscope and a subsequent CR-14 chromium etch. The line width of these structures is approximately 60 nm and the height of the lines is approximately 10 nm. In addition, experiments have been performed to determine the Cr etch rate in CR-14 etchant and the thickness of the Cr layer that could be oxidized through by the STM tunnelling current.",
author = "W. Xie and X. Dai and Xu, {L. S.} and David Allee and J. Spector",
year = "1997",
month = "6",
doi = "10.1088/0957-4484/8/2/007",
language = "English (US)",
volume = "8",
pages = "88--93",
journal = "Nanotechnology",
issn = "0957-4484",
publisher = "IOP Publishing Ltd.",
number = "2",

}

TY - JOUR

T1 - Fabrication of Cr nanostructures with the scanning tunnelling microscope

AU - Xie, W.

AU - Dai, X.

AU - Xu, L. S.

AU - Allee, David

AU - Spector, J.

PY - 1997/6

Y1 - 1997/6

N2 - In this work, nanometer scale electrically conducting lines and quantum structures on chromium (Cr) films have been fabricated with an ambient scanning tunnelling microscope and a subsequent CR-14 chromium etch. The line width of these structures is approximately 60 nm and the height of the lines is approximately 10 nm. In addition, experiments have been performed to determine the Cr etch rate in CR-14 etchant and the thickness of the Cr layer that could be oxidized through by the STM tunnelling current.

AB - In this work, nanometer scale electrically conducting lines and quantum structures on chromium (Cr) films have been fabricated with an ambient scanning tunnelling microscope and a subsequent CR-14 chromium etch. The line width of these structures is approximately 60 nm and the height of the lines is approximately 10 nm. In addition, experiments have been performed to determine the Cr etch rate in CR-14 etchant and the thickness of the Cr layer that could be oxidized through by the STM tunnelling current.

UR - http://www.scopus.com/inward/record.url?scp=0031167308&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031167308&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/8/2/007

DO - 10.1088/0957-4484/8/2/007

M3 - Article

AN - SCOPUS:0031167308

VL - 8

SP - 88

EP - 93

JO - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 2

ER -