Experimenting with large-scale semiconductor manufacturing simulations: A frequency domain approach to factor screening

Jennifer Robinson, Lee Schruben, John Fowler

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

Frequency domain experiments can provide an efficient way to identify important factors of a real system through the use of simulation models. In these experiments, input factors are oscillated at different frequencies. Detecting an oscillation in the output of a particular frequency indicates that the corresponding input variable (or an interaction) has significant impact. This technique is illustrated in factor screening and bottleneck analysis of an actual semiconductor wafer fabrication facility.

Original languageEnglish (US)
Title of host publicationProceedings of the Industrial Engineering Research Conference
EditorsDeborah A. Mitta, Laura I. Burke, John R. English, Jennie Gallimore, Georgia-Ann Klutke, Gregory L. Tonkay
Place of PublicationNorcross, GA, United States
PublisherPubl by IIE
Pages112-116
Number of pages5
ISBN (Print)0898061326
StatePublished - 1993
Externally publishedYes
EventProceedings of the 2nd Industrial Engineering Research Conference - Los Angeles, CA, USA
Duration: May 26 1993May 28 1993

Other

OtherProceedings of the 2nd Industrial Engineering Research Conference
CityLos Angeles, CA, USA
Period5/26/935/28/93

Fingerprint

Screening
Semiconductor materials
Experiments
Fabrication

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Robinson, J., Schruben, L., & Fowler, J. (1993). Experimenting with large-scale semiconductor manufacturing simulations: A frequency domain approach to factor screening. In D. A. Mitta, L. I. Burke, J. R. English, J. Gallimore, G-A. Klutke, & G. L. Tonkay (Eds.), Proceedings of the Industrial Engineering Research Conference (pp. 112-116). Norcross, GA, United States: Publ by IIE.

Experimenting with large-scale semiconductor manufacturing simulations : A frequency domain approach to factor screening. / Robinson, Jennifer; Schruben, Lee; Fowler, John.

Proceedings of the Industrial Engineering Research Conference. ed. / Deborah A. Mitta; Laura I. Burke; John R. English; Jennie Gallimore; Georgia-Ann Klutke; Gregory L. Tonkay. Norcross, GA, United States : Publ by IIE, 1993. p. 112-116.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Robinson, J, Schruben, L & Fowler, J 1993, Experimenting with large-scale semiconductor manufacturing simulations: A frequency domain approach to factor screening. in DA Mitta, LI Burke, JR English, J Gallimore, G-A Klutke & GL Tonkay (eds), Proceedings of the Industrial Engineering Research Conference. Publ by IIE, Norcross, GA, United States, pp. 112-116, Proceedings of the 2nd Industrial Engineering Research Conference, Los Angeles, CA, USA, 5/26/93.
Robinson J, Schruben L, Fowler J. Experimenting with large-scale semiconductor manufacturing simulations: A frequency domain approach to factor screening. In Mitta DA, Burke LI, English JR, Gallimore J, Klutke G-A, Tonkay GL, editors, Proceedings of the Industrial Engineering Research Conference. Norcross, GA, United States: Publ by IIE. 1993. p. 112-116
Robinson, Jennifer ; Schruben, Lee ; Fowler, John. / Experimenting with large-scale semiconductor manufacturing simulations : A frequency domain approach to factor screening. Proceedings of the Industrial Engineering Research Conference. editor / Deborah A. Mitta ; Laura I. Burke ; John R. English ; Jennie Gallimore ; Georgia-Ann Klutke ; Gregory L. Tonkay. Norcross, GA, United States : Publ by IIE, 1993. pp. 112-116
@inproceedings{8d1532e1a0ca46e68d87bef66bc8ee36,
title = "Experimenting with large-scale semiconductor manufacturing simulations: A frequency domain approach to factor screening",
abstract = "Frequency domain experiments can provide an efficient way to identify important factors of a real system through the use of simulation models. In these experiments, input factors are oscillated at different frequencies. Detecting an oscillation in the output of a particular frequency indicates that the corresponding input variable (or an interaction) has significant impact. This technique is illustrated in factor screening and bottleneck analysis of an actual semiconductor wafer fabrication facility.",
author = "Jennifer Robinson and Lee Schruben and John Fowler",
year = "1993",
language = "English (US)",
isbn = "0898061326",
pages = "112--116",
editor = "Mitta, {Deborah A.} and Burke, {Laura I.} and English, {John R.} and Jennie Gallimore and Georgia-Ann Klutke and Tonkay, {Gregory L.}",
booktitle = "Proceedings of the Industrial Engineering Research Conference",
publisher = "Publ by IIE",

}

TY - GEN

T1 - Experimenting with large-scale semiconductor manufacturing simulations

T2 - A frequency domain approach to factor screening

AU - Robinson, Jennifer

AU - Schruben, Lee

AU - Fowler, John

PY - 1993

Y1 - 1993

N2 - Frequency domain experiments can provide an efficient way to identify important factors of a real system through the use of simulation models. In these experiments, input factors are oscillated at different frequencies. Detecting an oscillation in the output of a particular frequency indicates that the corresponding input variable (or an interaction) has significant impact. This technique is illustrated in factor screening and bottleneck analysis of an actual semiconductor wafer fabrication facility.

AB - Frequency domain experiments can provide an efficient way to identify important factors of a real system through the use of simulation models. In these experiments, input factors are oscillated at different frequencies. Detecting an oscillation in the output of a particular frequency indicates that the corresponding input variable (or an interaction) has significant impact. This technique is illustrated in factor screening and bottleneck analysis of an actual semiconductor wafer fabrication facility.

UR - http://www.scopus.com/inward/record.url?scp=0027843313&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0027843313&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0027843313

SN - 0898061326

SP - 112

EP - 116

BT - Proceedings of the Industrial Engineering Research Conference

A2 - Mitta, Deborah A.

A2 - Burke, Laura I.

A2 - English, John R.

A2 - Gallimore, Jennie

A2 - Klutke, Georgia-Ann

A2 - Tonkay, Gregory L.

PB - Publ by IIE

CY - Norcross, GA, United States

ER -