EUV testing of multilayer mirrors: Critical issues

S. B. Hill; Ivan Ermanoski; S. Grantham; C. Tarrio; T. B. Lucatorto; T. E. Madey; S. Bajt; M. Chandhok; P. Yan; O. Wood; S. Wurm; N. V. Edwards

doi:10.1117/12.656502

EUV testing of multilayer mirrors: Critical issues

S. B. Hill, Ivan Ermanoski, S. Grantham, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Chandhok, P. Yan, O. Wood, S. Wurm, N. V. Edwards

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

15 Scopus citations

Abstract

Recently, while performing extensive EUV irradiation endurance testing on Ru-capped multilayer mirrors in the presence of elevated partial pressures of water and hydrocarbons, NIST has observed that the amount of EUV-induced damage actually decreases with increasing levels of water vapor above -5×10 ^-7 Torr. It is thought that the admitted water vapor may interact with otherwise stable, condensed carbonaceous species in an UHV vacuum system to increase the background levels of simple gaseous carbon-containing molecules. Some support for this hypothesis was demonstrated by observing the mitigating effect of very small levels of simple hydrocarbons with the intentional introduction of methyl alcohol in addition to the water vapor. It was found that the damage rate decreased by at least an order of magnitude when the partial pressure of methyl alcohol was just one percent of the water partial pressure. These observations indicate that the hydrocarbon components of the vacuum environment under actual testing conditions must be characterized and controlled to 10 ^-11Torr or better in order to quantify the damage caused by high levels of water vapor. The possible effects of exposure beam size and out-of-band radiation on mirror lifetime testing will also be discussed.

Original language	English (US)
Title of host publication	Emerging Lithographic Technologies X
DOIs	https://doi.org/10.1117/12.656502
State	Published - 2006
Event	Emerging Lithographic Technologies X - San Jose, CA, United States Duration: Jan 21 2006 → Jan 23 2006

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6151 I
ISSN (Print)	0277-786X

Other

Other	Emerging Lithographic Technologies X
Country/Territory	United States
City	San Jose, CA
Period	1/21/06 → 1/23/06

Keywords

EUV optics
Extreme ultraviolet
Lifetime testing
Lithography
Reflectometry
Ruthenium films

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.656502

Cite this

Hill, S. B., Ermanoski, I., Grantham, S., Tarrio, C., Lucatorto, T. B., Madey, T. E., Bajt, S., Chandhok, M., Yan, P., Wood, O., Wurm, S., & Edwards, N. V. (2006). EUV testing of multilayer mirrors: Critical issues. In Emerging Lithographic Technologies X Article 61510F (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6151 I). https://doi.org/10.1117/12.656502

Hill, SB, Ermanoski, I, Grantham, S, Tarrio, C, Lucatorto, TB, Madey, TE, Bajt, S, Chandhok, M, Yan, P, Wood, O, Wurm, S & Edwards, NV 2006, EUV testing of multilayer mirrors: Critical issues. in Emerging Lithographic Technologies X., 61510F, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6151 I, Emerging Lithographic Technologies X, San Jose, CA, United States, 1/21/06. https://doi.org/10.1117/12.656502

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abstract = "Recently, while performing extensive EUV irradiation endurance testing on Ru-capped multilayer mirrors in the presence of elevated partial pressures of water and hydrocarbons, NIST has observed that the amount of EUV-induced damage actually decreases with increasing levels of water vapor above -5×10 -7 Torr. It is thought that the admitted water vapor may interact with otherwise stable, condensed carbonaceous species in an UHV vacuum system to increase the background levels of simple gaseous carbon-containing molecules. Some support for this hypothesis was demonstrated by observing the mitigating effect of very small levels of simple hydrocarbons with the intentional introduction of methyl alcohol in addition to the water vapor. It was found that the damage rate decreased by at least an order of magnitude when the partial pressure of methyl alcohol was just one percent of the water partial pressure. These observations indicate that the hydrocarbon components of the vacuum environment under actual testing conditions must be characterized and controlled to 10 -11Torr or better in order to quantify the damage caused by high levels of water vapor. The possible effects of exposure beam size and out-of-band radiation on mirror lifetime testing will also be discussed.",

keywords = "EUV optics, Extreme ultraviolet, Lifetime testing, Lithography, Reflectometry, Ruthenium films",

author = "Hill, {S. B.} and Ivan Ermanoski and S. Grantham and C. Tarrio and Lucatorto, {T. B.} and Madey, {T. E.} and S. Bajt and M. Chandhok and P. Yan and O. Wood and S. Wurm and Edwards, {N. V.}",

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AU - Lucatorto, T. B.

AU - Madey, T. E.

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N2 - Recently, while performing extensive EUV irradiation endurance testing on Ru-capped multilayer mirrors in the presence of elevated partial pressures of water and hydrocarbons, NIST has observed that the amount of EUV-induced damage actually decreases with increasing levels of water vapor above -5×10 -7 Torr. It is thought that the admitted water vapor may interact with otherwise stable, condensed carbonaceous species in an UHV vacuum system to increase the background levels of simple gaseous carbon-containing molecules. Some support for this hypothesis was demonstrated by observing the mitigating effect of very small levels of simple hydrocarbons with the intentional introduction of methyl alcohol in addition to the water vapor. It was found that the damage rate decreased by at least an order of magnitude when the partial pressure of methyl alcohol was just one percent of the water partial pressure. These observations indicate that the hydrocarbon components of the vacuum environment under actual testing conditions must be characterized and controlled to 10 -11Torr or better in order to quantify the damage caused by high levels of water vapor. The possible effects of exposure beam size and out-of-band radiation on mirror lifetime testing will also be discussed.

AB - Recently, while performing extensive EUV irradiation endurance testing on Ru-capped multilayer mirrors in the presence of elevated partial pressures of water and hydrocarbons, NIST has observed that the amount of EUV-induced damage actually decreases with increasing levels of water vapor above -5×10 -7 Torr. It is thought that the admitted water vapor may interact with otherwise stable, condensed carbonaceous species in an UHV vacuum system to increase the background levels of simple gaseous carbon-containing molecules. Some support for this hypothesis was demonstrated by observing the mitigating effect of very small levels of simple hydrocarbons with the intentional introduction of methyl alcohol in addition to the water vapor. It was found that the damage rate decreased by at least an order of magnitude when the partial pressure of methyl alcohol was just one percent of the water partial pressure. These observations indicate that the hydrocarbon components of the vacuum environment under actual testing conditions must be characterized and controlled to 10 -11Torr or better in order to quantify the damage caused by high levels of water vapor. The possible effects of exposure beam size and out-of-band radiation on mirror lifetime testing will also be discussed.

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KW - Reflectometry

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ER -

EUV testing of multilayer mirrors: Critical issues

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