Erratum: Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

M. C. Zeman, C. C. Fulton, G. Lucovsky, R. J. Nemanich, W. C. Yang

Research output: Contribution to journalComment/debate

1 Scopus citations
Original languageEnglish (US)
Article number109902
JournalJournal of Applied Physics
Volume99
Issue number10
DOIs
StatePublished - May 15 2006
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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