Effects of varying CoCrV seed layer deposition pressure on Ru crystallinity in perpendicular magnetic recording media

W. Joost; A. Das; Terry Alford

doi:10.1063/1.3225993

Effects of varying CoCrV seed layer deposition pressure on Ru crystallinity in perpendicular magnetic recording media

W. Joost, A. Das, Terry Alford

Research output: Contribution to journal › Article › peer-review

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Abstract

The effects of varying deposition parameters of a CoCrV seed layer under Ru on the structural and interfacial properties of both layers were studied. While sputtering power showed little effect on film structure, sputtering pressure during deposition of the seed layer had a significant effect on the structural properties of the seed layer. In particular, the grain morphology and crystallinity of the seed layer varied considerably with deposition pressure. Deposition of Ru using a constant recipe for all samples demonstrated the effect of varying seed layer deposition pressure on the Ru layer. The strain energy of the Ru film, a measurement of contraction due to the registry with the seed layer, was greatest at moderate seed layer sputtering pressures, while the Ru(0002) peak area was greatest at low sputtering pressures. The competing contributions of interfacial energy and strain energy describe this effect, with interfacial energy dominating at low sputtering pressures.

Original language	English (US)
Article number	073517
Journal	Journal of Applied Physics
Volume	106
Issue number	7
DOIs	https://doi.org/10.1063/1.3225993
State	Published - 2009

ASJC Scopus subject areas

General Physics and Astronomy

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title = "Effects of varying CoCrV seed layer deposition pressure on Ru crystallinity in perpendicular magnetic recording media",

abstract = "The effects of varying deposition parameters of a CoCrV seed layer under Ru on the structural and interfacial properties of both layers were studied. While sputtering power showed little effect on film structure, sputtering pressure during deposition of the seed layer had a significant effect on the structural properties of the seed layer. In particular, the grain morphology and crystallinity of the seed layer varied considerably with deposition pressure. Deposition of Ru using a constant recipe for all samples demonstrated the effect of varying seed layer deposition pressure on the Ru layer. The strain energy of the Ru film, a measurement of contraction due to the registry with the seed layer, was greatest at moderate seed layer sputtering pressures, while the Ru(0002) peak area was greatest at low sputtering pressures. The competing contributions of interfacial energy and strain energy describe this effect, with interfacial energy dominating at low sputtering pressures.",

author = "W. Joost and A. Das and Terry Alford",

note = "Funding Information: The authors would like to thank Heraeus Materials Technology LLC (HMT) for the support of this project. The authors are grateful to Bernd Kunkel and Mike Racine at HMT for their help and support. Thanks are also due to Tim Karcher, Karthik Sivaramakrishnan, and Anil Indluru for their help with preparing and analyzing samples. The authors gratefully acknowledge the use of the facilities within the Center for Solid State Science at Arizona State University.",

year = "2009",

doi = "10.1063/1.3225993",

language = "English (US)",

volume = "106",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

number = "7",

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TY - JOUR

T1 - Effects of varying CoCrV seed layer deposition pressure on Ru crystallinity in perpendicular magnetic recording media

AU - Joost, W.

AU - Das, A.

AU - Alford, Terry

N1 - Funding Information: The authors would like to thank Heraeus Materials Technology LLC (HMT) for the support of this project. The authors are grateful to Bernd Kunkel and Mike Racine at HMT for their help and support. Thanks are also due to Tim Karcher, Karthik Sivaramakrishnan, and Anil Indluru for their help with preparing and analyzing samples. The authors gratefully acknowledge the use of the facilities within the Center for Solid State Science at Arizona State University.

PY - 2009

Y1 - 2009

N2 - The effects of varying deposition parameters of a CoCrV seed layer under Ru on the structural and interfacial properties of both layers were studied. While sputtering power showed little effect on film structure, sputtering pressure during deposition of the seed layer had a significant effect on the structural properties of the seed layer. In particular, the grain morphology and crystallinity of the seed layer varied considerably with deposition pressure. Deposition of Ru using a constant recipe for all samples demonstrated the effect of varying seed layer deposition pressure on the Ru layer. The strain energy of the Ru film, a measurement of contraction due to the registry with the seed layer, was greatest at moderate seed layer sputtering pressures, while the Ru(0002) peak area was greatest at low sputtering pressures. The competing contributions of interfacial energy and strain energy describe this effect, with interfacial energy dominating at low sputtering pressures.

AB - The effects of varying deposition parameters of a CoCrV seed layer under Ru on the structural and interfacial properties of both layers were studied. While sputtering power showed little effect on film structure, sputtering pressure during deposition of the seed layer had a significant effect on the structural properties of the seed layer. In particular, the grain morphology and crystallinity of the seed layer varied considerably with deposition pressure. Deposition of Ru using a constant recipe for all samples demonstrated the effect of varying seed layer deposition pressure on the Ru layer. The strain energy of the Ru film, a measurement of contraction due to the registry with the seed layer, was greatest at moderate seed layer sputtering pressures, while the Ru(0002) peak area was greatest at low sputtering pressures. The competing contributions of interfacial energy and strain energy describe this effect, with interfacial energy dominating at low sputtering pressures.

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DO - 10.1063/1.3225993

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VL - 106

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 7

M1 - 073517

ER -

Effects of varying CoCrV seed layer deposition pressure on Ru crystallinity in perpendicular magnetic recording media

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