Characterization of hydrogen etched 6H-SiC(0001) substrates and subsequently grown AIN films

J. D. Hartman, A. M. Roskowski, Z. J. Reitmeier, K. M. Tracy, R. F. Davis, Robert Nemanich

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Characterization of hydrogen etched 6H-SiC(0001) substrates and subsequently grown AlN films was presented. Atomic force microscopy, optical microscopy, low energy electron diffraction of the etched surface showed a faceted surface morphology with unit cell and half unit cell high steps and a 1×1 reconstruction. Annealing the etched samples under ultrahigh vacuum (UHV) at 1030°C for 15 min resulted in a reduction of the surface oxygen and hydrocarbons below the detection limit of Auger electron spectroscopy.

Original languageEnglish (US)
Pages (from-to)394-400
Number of pages7
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number2
DOIs
StatePublished - Mar 2003
Externally publishedYes

Fingerprint

Hydrogen
Low energy electron diffraction
Ultrahigh vacuum
Substrates
hydrogen
Auger electron spectroscopy
Hydrocarbons
Optical microscopy
Surface morphology
Atomic force microscopy
Annealing
Oxygen
cells
ultrahigh vacuum
Auger spectroscopy
electron spectroscopy
electron diffraction
hydrocarbons
atomic force microscopy
microscopy

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Characterization of hydrogen etched 6H-SiC(0001) substrates and subsequently grown AIN films. / Hartman, J. D.; Roskowski, A. M.; Reitmeier, Z. J.; Tracy, K. M.; Davis, R. F.; Nemanich, Robert.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 21, No. 2, 03.2003, p. 394-400.

Research output: Contribution to journalArticle

Hartman, J. D. ; Roskowski, A. M. ; Reitmeier, Z. J. ; Tracy, K. M. ; Davis, R. F. ; Nemanich, Robert. / Characterization of hydrogen etched 6H-SiC(0001) substrates and subsequently grown AIN films. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2003 ; Vol. 21, No. 2. pp. 394-400.
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