Abstract
A feed-forward and adaptive feedback control methodology is developed and experimentally applied to several different processes commonly used in the fabrication of semiconductor integrated circuit devices. A circular parallel-plate capacitor with a glass (SiO 2) dielectric is manufactured on silicon wafers to illustrate the use of these control strategies in the processes of silicon oxidation, aluminum metallization, lithography, and aluminum etching. The goal is to maintain a constant capacitance value on a run to run basis regardless of disturbances or modeling errors in the processes.
| Original language | English (US) |
|---|---|
| Title of host publication | Proceedings of the American Control Conference |
| Publisher | American Automatic Control Council |
| Pages | 892-896 |
| Number of pages | 5 |
| Volume | 1 |
| State | Published - 1994 |
| Event | Proceedings of the 1994 American Control Conference. Part 1 (of 3) - Baltimore, MD, USA Duration: Jun 29 1994 → Jul 1 1994 |
Other
| Other | Proceedings of the 1994 American Control Conference. Part 1 (of 3) |
|---|---|
| City | Baltimore, MD, USA |
| Period | 6/29/94 → 7/1/94 |
ASJC Scopus subject areas
- Control and Systems Engineering