Application of feed-forward and adaptive feedback control to semiconductor device manufacturing

K. Stoddard, P. Crouch, Michael Kozicki, Konstantinos Tsakalis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations

Abstract

A feed-forward and adaptive feedback control methodology is developed and experimentally applied to several different processes commonly used in the fabrication of semiconductor integrated circuit devices. A circular parallel-plate capacitor with a glass (SiO 2) dielectric is manufactured on silicon wafers to illustrate the use of these control strategies in the processes of silicon oxidation, aluminum metallization, lithography, and aluminum etching. The goal is to maintain a constant capacitance value on a run to run basis regardless of disturbances or modeling errors in the processes.

Original languageEnglish (US)
Title of host publicationProceedings of the American Control Conference
PublisherAmerican Automatic Control Council
Pages892-896
Number of pages5
Volume1
StatePublished - 1994
EventProceedings of the 1994 American Control Conference. Part 1 (of 3) - Baltimore, MD, USA
Duration: Jun 29 1994Jul 1 1994

Other

OtherProceedings of the 1994 American Control Conference. Part 1 (of 3)
CityBaltimore, MD, USA
Period6/29/947/1/94

ASJC Scopus subject areas

  • Control and Systems Engineering

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    Stoddard, K., Crouch, P., Kozicki, M., & Tsakalis, K. (1994). Application of feed-forward and adaptive feedback control to semiconductor device manufacturing. In Proceedings of the American Control Conference (Vol. 1, pp. 892-896). American Automatic Control Council.