Anomalous sputter yields due to cascade mixing

Research output: Contribution to journalArticle

44 Scopus citations

Abstract

Sputter-removal rates of overlayer and interfacial species on silicon are analyzed to determine sputtering yields for the species involved. Sputtering yields up to two orders of magnitude lower than those measured for silicon are found, and the results are interpreted in terms of a cascade mixing process which continually reburies much of the overlayer material beyond the escape depth of the sputtered atoms.

Original languageEnglish (US)
Pages (from-to)758-760
Number of pages3
JournalApplied Physics Letters
Volume36
Issue number9
DOIs
StatePublished - Dec 1 1980
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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