Annealing studies of Ru/Si multilayer by high-angle annular dark field microscopy and HREM

Y. Cheng; J. Liu; M. B. Stearns; D. G. Stearns

doi:10.1117/12.51278

Annealing studies of Ru/Si multilayer by high-angle annular dark field microscopy and HREM

Y. Cheng, J. Liu, M. B. Stearns, D. G. Stearns

Physics

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

Two different electron microscopy techniques were used to study a Ru/Si multilayer (ML) film. The structure of the multilayer was characterized by high-resolution electron microscopy (HREM). The multilayer compositional profile and its thermal stability were studied by using high-angle annular dark-field (HAADF) microscopy. Initially, the Ru/Si ML was found to have a well-defined multilayer structure. After annealing of the sample at 150°C for 30 minutes, we observed that the Ru and Si layers were highly interdiffused with large Ru silicide crystals being formed in the multilayer film.

Original language	English (US)
Pages (from-to)	167-175
Number of pages	9
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	1547
DOIs	https://doi.org/10.1117/12.51278
State	Published - Jan 1 1992
Event	Multilayer Optics for Advanced X-Ray Applications 1991 - San Diego, United States Duration: Jul 21 1991 → …

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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title = "Annealing studies of Ru/Si multilayer by high-angle annular dark field microscopy and HREM",

abstract = "Two different electron microscopy techniques were used to study a Ru/Si multilayer (ML) film. The structure of the multilayer was characterized by high-resolution electron microscopy (HREM). The multilayer compositional profile and its thermal stability were studied by using high-angle annular dark-field (HAADF) microscopy. Initially, the Ru/Si ML was found to have a well-defined multilayer structure. After annealing of the sample at 150°C for 30 minutes, we observed that the Ru and Si layers were highly interdiffused with large Ru silicide crystals being formed in the multilayer film.",

author = "Y. Cheng and J. Liu and Stearns, {M. B.} and Stearns, {D. G.}",

note = "Funding Information: This work was partially supported by Lawrence Livermore National Laboratory through the Department of Energy contract No. W-7405-Eng-48, and by Shell foundation. The EM work was done on the facilities partially supported by NSF Grant No. DMR-8611609. The x-ray data were obtained on equipment purchased under NSF Grant No. DMR-8406823. Funding Information: Department of Energy contract No. W-7405-Eng-48, and by Shell foundation. The EM work was done on the facilities partially supported by NSF Grant No. DMR-861 1609. The x-ray data were obtained on equipment purchased under NSF Grant No. DMR-8406823. Funding Information: This work was partially supported by Lawrence Livermore National Laboratory through the Publisher Copyright: {\textcopyright} 1992 SPIE. All rights reserved.; Multilayer Optics for Advanced X-Ray Applications 1991 ; Conference date: 21-07-1991",

year = "1992",

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AU - Cheng, Y.

AU - Liu, J.

AU - Stearns, M. B.

AU - Stearns, D. G.

N1 - Funding Information: This work was partially supported by Lawrence Livermore National Laboratory through the Department of Energy contract No. W-7405-Eng-48, and by Shell foundation. The EM work was done on the facilities partially supported by NSF Grant No. DMR-8611609. The x-ray data were obtained on equipment purchased under NSF Grant No. DMR-8406823. Funding Information: Department of Energy contract No. W-7405-Eng-48, and by Shell foundation. The EM work was done on the facilities partially supported by NSF Grant No. DMR-861 1609. The x-ray data were obtained on equipment purchased under NSF Grant No. DMR-8406823. Funding Information: This work was partially supported by Lawrence Livermore National Laboratory through the Publisher Copyright: © 1992 SPIE. All rights reserved.

PY - 1992/1/1

Y1 - 1992/1/1

N2 - Two different electron microscopy techniques were used to study a Ru/Si multilayer (ML) film. The structure of the multilayer was characterized by high-resolution electron microscopy (HREM). The multilayer compositional profile and its thermal stability were studied by using high-angle annular dark-field (HAADF) microscopy. Initially, the Ru/Si ML was found to have a well-defined multilayer structure. After annealing of the sample at 150°C for 30 minutes, we observed that the Ru and Si layers were highly interdiffused with large Ru silicide crystals being formed in the multilayer film.

AB - Two different electron microscopy techniques were used to study a Ru/Si multilayer (ML) film. The structure of the multilayer was characterized by high-resolution electron microscopy (HREM). The multilayer compositional profile and its thermal stability were studied by using high-angle annular dark-field (HAADF) microscopy. Initially, the Ru/Si ML was found to have a well-defined multilayer structure. After annealing of the sample at 150°C for 30 minutes, we observed that the Ru and Si layers were highly interdiffused with large Ru silicide crystals being formed in the multilayer film.

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Multilayer Optics for Advanced X-Ray Applications 1991

Y2 - 21 July 1991

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Annealing studies of Ru/Si multilayer by high-angle annular dark field microscopy and HREM

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