Abstract
Thin films composed of nanoparticles are used in a variety of applications, from antireflective coatings in photovoltaic modules to antibacterial agents in textiles. In this work, we demonstrate an aerosol-impaction-based process for forming uniform thin films of controllable thickness and porosity on large-area substrates. Through a combination of scanning electron microscopy, Rutherford backscattering, and elliposometry, we demonstrate silicon nanoparticle films with independently tunable thicknesses between 50 nm and 3 μm and porosities between 67% and 95%. We further demonstrate the scalability of this process by forming films with <7% thickness nonuniformity and <1% porosity nonuniformity on 125-mm-diameter silicon substrates.
Original language | English (US) |
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Pages (from-to) | 4351-4357 |
Number of pages | 7 |
Journal | ACS Applied Nano Materials |
Volume | 1 |
Issue number | 8 |
DOIs | |
State | Published - Aug 24 2018 |
Keywords
- aerosol
- coating
- nanoparticle
- plasma
- porosity
- thin film
ASJC Scopus subject areas
- Materials Science(all)