A novel approach for an electrical vernier to measure mask misalignment

A. J. Walton; D. Ward; J. M. Robertson; R. J. Holwill

doi:10.1007/978-3-642-52314-4_198

A novel approach for an electrical vernier to measure mask misalignment

A. J. Walton, D. Ward, J. M. Robertson, R. J. Holwill

Arizona State University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Scopus citations

Abstract

A novel interconnect scheme is presented which reduces the number of pads required by electrical verniers to measure mask misalignment. It makes the use of a shift register no longer necessary to keep the pad count to a reasonable number and the process is only required to support the fabrication of diodes. The vernier can be measured using any test equipment which can test for continuity.

Original language	English (US)
Title of host publication	ESSDERC 1989 - Proceedings of the 19th European Solid State Device Research Conference
Editors	Anton Heuberger, Heiner Ryssel, Peter Lange
Publisher	IEEE Computer Society
Pages	950-953
Number of pages	4
ISBN (Electronic)	0387510001
ISBN (Print)	9780387510002
DOIs	https://doi.org/10.1007/978-3-642-52314-4_198
State	Published - Jan 1 1989
Event	19th European Solid State Device Research Conference, ESSDERC 1989 - Berlin, Germany Duration: Sep 11 1989 → Sep 14 1989

Publication series

Name	European Solid-State Device Research Conference
ISSN (Print)	1930-8876

Other

Other	19th European Solid State Device Research Conference, ESSDERC 1989
Country/Territory	Germany
City	Berlin
Period	9/11/89 → 9/14/89

ASJC Scopus subject areas

Electrical and Electronic Engineering
Safety, Risk, Reliability and Quality

Access to Document

10.1007/978-3-642-52314-4_198

Cite this

Walton, A. J., Ward, D., Robertson, J. M., & Holwill, R. J. (1989). A novel approach for an electrical vernier to measure mask misalignment. In A. Heuberger, H. Ryssel, & P. Lange (Eds.), ESSDERC 1989 - Proceedings of the 19th European Solid State Device Research Conference (pp. 950-953). [5437060] (European Solid-State Device Research Conference). IEEE Computer Society. https://doi.org/10.1007/978-3-642-52314-4_198

A novel approach for an electrical vernier to measure mask misalignment. / Walton, A. J.; Ward, D.; Robertson, J. M. et al.
ESSDERC 1989 - Proceedings of the 19th European Solid State Device Research Conference. ed. / Anton Heuberger; Heiner Ryssel; Peter Lange. IEEE Computer Society, 1989. p. 950-953 5437060 (European Solid-State Device Research Conference).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Walton, AJ, Ward, D, Robertson, JM & Holwill, RJ 1989, A novel approach for an electrical vernier to measure mask misalignment. in A Heuberger, H Ryssel & P Lange (eds), ESSDERC 1989 - Proceedings of the 19th European Solid State Device Research Conference., 5437060, European Solid-State Device Research Conference, IEEE Computer Society, pp. 950-953, 19th European Solid State Device Research Conference, ESSDERC 1989, Berlin, Germany, 9/11/89. https://doi.org/10.1007/978-3-642-52314-4_198

Walton AJ, Ward D, Robertson JM, Holwill RJ. A novel approach for an electrical vernier to measure mask misalignment. In Heuberger A, Ryssel H, Lange P, editors, ESSDERC 1989 - Proceedings of the 19th European Solid State Device Research Conference. IEEE Computer Society. 1989. p. 950-953. 5437060. (European Solid-State Device Research Conference). doi: 10.1007/978-3-642-52314-4_198

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A novel approach for an electrical vernier to measure mask misalignment

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