A novel approach for an electrical vernier to measure mask misalignment

A. J. Walton, D. Ward, J. M. Robertson, R. J. Holwill

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Scopus citations

Abstract

A novel interconnect scheme is presented which reduces the number of pads required by electrical verniers to measure mask misalignment. It makes the use of a shift register no longer necessary to keep the pad count to a reasonable number and the process is only required to support the fabrication of diodes. The vernier can be measured using any test equipment which can test for continuity.

Original languageEnglish (US)
Title of host publicationESSDERC 1989 - Proceedings of the 19th European Solid State Device Research Conference
EditorsHeiner Ryssel, Anton Heuberger, Peter Lange
PublisherIEEE Computer Society
Pages950-953
Number of pages4
ISBN (Electronic)0387510001
ISBN (Print)9780387510002
StatePublished - Jan 1 1989
Event19th European Solid State Device Research Conference, ESSDERC 1989 - Berlin, Germany
Duration: Sep 11 1989Sep 14 1989

Publication series

NameEuropean Solid-State Device Research Conference
ISSN (Print)1930-8876

Other

Other19th European Solid State Device Research Conference, ESSDERC 1989
CountryGermany
CityBerlin
Period9/11/899/14/89

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ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Safety, Risk, Reliability and Quality

Cite this

Walton, A. J., Ward, D., Robertson, J. M., & Holwill, R. J. (1989). A novel approach for an electrical vernier to measure mask misalignment. In H. Ryssel, A. Heuberger, & P. Lange (Eds.), ESSDERC 1989 - Proceedings of the 19th European Solid State Device Research Conference (pp. 950-953). [5437060] (European Solid-State Device Research Conference). IEEE Computer Society.