@inproceedings{6c628519ef3c405097fd161489c04055,
title = "A novel approach for an electrical vernier to measure mask misalignment",
abstract = "A novel interconnect scheme is presented which reduces the number of pads required by electrical verniers to measure mask misalignment. It makes the use of a shift register no longer necessary to keep the pad count to a reasonable number and the process is only required to support the fabrication of diodes. The vernier can be measured using any test equipment which can test for continuity.",
author = "Walton, {A. J.} and D. Ward and Robertson, {J. M.} and Holwill, {R. J.}",
note = "Publisher Copyright: {\textcopyright} 1989 Springer-Verlag Heidelberg. {\textcopyright} 1989 Springer-Verlag Bcrbn Heidelberg. All Rights Reserved.; 19th European Solid State Device Research Conference, ESSDERC 1989 ; Conference date: 11-09-1989 Through 14-09-1989",
year = "1989",
doi = "10.1007/978-3-642-52314-4_198",
language = "English (US)",
isbn = "9780387510002",
series = "European Solid-State Device Research Conference",
publisher = "IEEE Computer Society",
pages = "950--953",
editor = "Anton Heuberger and Heiner Ryssel and Peter Lange",
booktitle = "ESSDERC 1989 - Proceedings of the 19th European Solid State Device Research Conference",
}