Abstract
The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub- 500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.
Original language | English (US) |
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Pages (from-to) | 1860-1865 |
Number of pages | 6 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 26 |
Issue number | 6 |
DOIs | |
State | Published - 2008 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering