@inproceedings{355e819827234ba9a666c34b4d63a9ca,
title = "A general model for PVD aluminum deposition",
abstract = "A model for free molecular transport, surface diffusion and heterogeneous reactions in features during low pressure deposition processes is specialized to simulate film profile evolution during sputtered Al PVD. The dimensionless parameter which results from nondimensionalizing the governing equation dictates film profiles. Feature size dependent step coverages are demonstrated in trenches of aspect ratio one.",
author = "Cale, {T. S.} and Gandy, {T. H.} and Jain, {M. K.} and M. Ramaswami and Raupp, {G. B.}",
note = "Publisher Copyright: {\textcopyright} 1991 IEEE.; 8th International IEEE VLSI Multilevel Interconnection Conference, VMIC 1991 ; Conference date: 11-06-1991 Through 12-06-1991",
year = "1991",
doi = "10.1109/VMIC.1991.153022",
language = "English (US)",
series = "1991 Proceedings 8th International IEEE VLSI Multilevel Interconnection Conference, VMIC 1991",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "350--352",
booktitle = "1991 Proceedings 8th International IEEE VLSI Multilevel Interconnection Conference, VMIC 1991",
}