Abstract
This work describes an improved Angelov/Chalmers MESFET model which includes substrate bias effects. The 4-terminal model employs a new and simplified gate current extraction method based on a forward and reverse diode equation which can be independently modified. The improved model is applied to a silicon metal-semiconductor-field-effect-transistor (MESFET) that was fabricated using a 45nm SOI CMOS process and designed for RF power amplifier applications. The model fits across DC and RF parameters and also shows a good fit to a 2.5GHz load pull measurement used for verification.
Original language | English (US) |
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Title of host publication | Proceedings of the 2015 IEEE Radio Frequency Integrated Circuits Symposium, RFIC 2015 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 359-362 |
Number of pages | 4 |
Volume | 2015-November |
ISBN (Electronic) | 9781479976416 |
DOIs | |
State | Published - Nov 25 2015 |
Event | IEEE Radio Frequency Integrated Circuits Symposium, RFIC 2015 - Phoenix, United States Duration: May 17 2015 → May 19 2015 |
Other
Other | IEEE Radio Frequency Integrated Circuits Symposium, RFIC 2015 |
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Country/Territory | United States |
City | Phoenix |
Period | 5/17/15 → 5/19/15 |
Keywords
- MESFETs
- silicon-on-insulator
ASJC Scopus subject areas
- Engineering(all)