Silicide Formation on Polycrystalline Silicon by Direct Metal Implantation

Michael Kozicki; J. M. Robertson

doi:10.1149/1.2096763

Silicide Formation on Polycrystalline Silicon by Direct Metal Implantation

Michael Kozicki, J. M. Robertson

Electrical Engineering

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Original language	English (US)
Pages (from-to)	878-881
Number of pages	4
Journal	Journal of the Electrochemical Society
Volume	136
Issue number	3
DOIs	https://doi.org/10.1149/1.2096763
State	Published - Mar 1989

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Renewable Energy, Sustainability and the Environment
Surfaces, Coatings and Films
Electrochemistry
Materials Chemistry

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10.1149/1.2096763

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title = "Silicide Formation on Polycrystalline Silicon by Direct Metal Implantation",

author = "Michael Kozicki and Robertson, {J. M.}",

year = "1989",

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publisher = "Electrochemical Society, Inc.",

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AU - Robertson, J. M.

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JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

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Silicide Formation on Polycrystalline Silicon by Direct Metal Implantation

ASJC Scopus subject areas

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