Abstract
A set of GaN/GaInN single quantum wells (SQWs) were grown on c-plane GaN/sapphire templates using metal organic vapor phase epitaxy (MOVPE) and atomic layer epitaxy (ALE). The structural information on the interfaces and surfaces was obtained by fitting the experimental X-ray spectra and was compared between MOVPE and ALE mode. The X-ray crystal truncation rod (CTR) scattering measurement results showed that the samples grown by ALE had sharper interfaces than those grown by MOVPE. Both the X-ray reflectivity (XRR) curve-fitting results and atomic force microscope (AFM) results indicated that the surfaces of the ALE-grown SQWs were smoother than those of MOVPE-grown SQWs.
Original language | English (US) |
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Pages (from-to) | 393-396 |
Number of pages | 4 |
Journal | Physica Status Solidi (C) Current Topics in Solid State Physics |
Volume | 11 |
Issue number | 3-4 |
DOIs | |
State | Published - Apr 2014 |
Externally published | Yes |
Keywords
- Atomic layer epitaxy
- Metalorganic vapor phase epitaxy
- X-ray crystal truncation rod scattering
- X-ray reflectivity
ASJC Scopus subject areas
- Condensed Matter Physics