Wave polymerization during vapor deposition of porous parylene-N dielectric films

James Erjavec, John Sikita, Stephen P. Beaudoin, Gregory Raupp

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

Parylene-N films vapor deposited near liquid nitrogen temperature (77 K) undergo a unique 'wave' polymerization process in which a rapidly moving reaction front is apparent as the film changes from translucent to optically opaque. This moving reaction front produces a highly porous polymer film. The porosity of these films is approximately 80%. By capturing the wave process on video we have quantified the moving 'wave' velocity, which averages 11 cm/s. Time-averaged deposition rates of the resulting opaque, porous films are more than 8 μm/min. This rate is more than two orders of magnitude greater than the measured deposition rates of nonporous films that are deposited at higher temperatures, at otherwise fixed conditions of monomer delivery rate and deposition chamber pressure.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages23-28
Number of pages6
Volume565
StatePublished - 1999
EventThe 1999 MRS Spring Meeting - Symposium O 'Low-Dielectric Constant Materials V' - San Francisco, CA, USA
Duration: Apr 5 1999Apr 8 1999

Other

OtherThe 1999 MRS Spring Meeting - Symposium O 'Low-Dielectric Constant Materials V'
CitySan Francisco, CA, USA
Period4/5/994/8/99

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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    Erjavec, J., Sikita, J., Beaudoin, S. P., & Raupp, G. (1999). Wave polymerization during vapor deposition of porous parylene-N dielectric films. In Materials Research Society Symposium - Proceedings (Vol. 565, pp. 23-28). Materials Research Society.