Virtual metrology and run-to-run control in semiconductor manufacturing

Y. Zhu, R. J. Baseman, J. He, D. D. Restaino, E. Yashchin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Virtual Metrology (VM) generally refers to a model based prediction of some process outcome in place of, or in the absence of, an actual physical measurement of that outcome. The underlying models are learned from histories of the actual physical outcomes and predictors that may include process trace data, tool consumable status, and incoming work characteristics. If the models are sufficiently accurate predictors of process outcomes, VM applications present the opportunity to reduce the number of physical measurements made to monitor a process, while maintaining or even improving quality control. Such applications are especially attractive for highly complex, capital intensive semiconductor manufacturing lines, in which measurements monitoring processes may add significant processing time and cost. In this paper, we propose a model for metrology variable prediction with tensor input process variables by directly operating on the tensor. Experimental results demonstrate the good performance of this model compared to others that are widely discussed in the literature of VM and deal with only one-dimensional inputs. We also propose three VM embedded run-to-run (R2R) control schemes that can facilitate feedback control based on the actual and virtual metrology values. We demonstrate the ability of the proposed control schemes to effectively reduce the process variation based on experiment results.

Original languageEnglish (US)
Title of host publicationProceedings - 18th ISSAT International Conference on Reliability and Quality in Design
Pages374-378
Number of pages5
StatePublished - Dec 1 2012
Event18th ISSAT International Conference on Reliability and Quality in Design - Boston, MA, United States
Duration: Jul 26 2012Jul 28 2012

Publication series

NameProceedings - 18th ISSAT International Conference on Reliability and Quality in Design

Other

Other18th ISSAT International Conference on Reliability and Quality in Design
CountryUnited States
CityBoston, MA
Period7/26/127/28/12

Keywords

  • Deposition process
  • Run-to-run control
  • Semiconductor manufacturing
  • Tensor inputs
  • Virtual metrology

ASJC Scopus subject areas

  • Safety, Risk, Reliability and Quality

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  • Cite this

    Zhu, Y., Baseman, R. J., He, J., Restaino, D. D., & Yashchin, E. (2012). Virtual metrology and run-to-run control in semiconductor manufacturing. In Proceedings - 18th ISSAT International Conference on Reliability and Quality in Design (pp. 374-378). (Proceedings - 18th ISSAT International Conference on Reliability and Quality in Design).