UV-FEL photo-electron emission microscopy of the dynamics of nanostructures on silicon surfaces

W. C. Yang, H. Ade, R. J. Nemanich

Research output: Contribution to journalConference article

1 Scopus citations

Abstract

The combination of a wavelength tunable UV free electron laser and a high resolution photo-electron emission microscope offers unprecedented opportunities for in situ, real time imaging of the dynamics of processes on surfaces on a nanometer scale. This type of system is now in operation at the Duke University Free Electron Laser Laboratory. In this study we report real time observations of the dynamics of liquid Pt-Si islands on Si(100) surfaces. The dynamics of coalescence is observed. Moreover, a driving force for motion of the liquid micro-droplets is developed based on these observations. We also report studies of the dynamics of growth of nanometer scale TiSi2 islands on Si(111). Depending on the growth conditions, we observe ripening or coalescence processes where smaller islands evolve into larger islands. On the (111) surface a shape transition is observed in which the islands are initially circular and then develop into long wire shaped structures. The growth processes represent a competition between kinetic and energetic processes on the surfaces.

Original languageEnglish (US)
Pages (from-to)168-176
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4274
DOIs
StatePublished - Jun 29 2001
Externally publishedYes
EventLaser Applications in Microelectronic and Optoelectronic Manufacturing VI 2001 - San Jose, United States
Duration: Jan 20 2001Jan 26 2001

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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