Using structural disorder to enhance the magnetism and spin-polarization in FexSi1-x thin films for spintronics

J. Karel, Y. N. Zhang, C. Bordel, K. H. Stone, Tingyong Chen, C. A. Jenkins, David Smith, J. Hu, R. Q. Wu, S. M. Heald, J. B. Kortright, F. Hellman

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Engineering & Materials Science

Chemical Compounds